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      1-Methoxy-2-propyl acetate (MPA)

      • Product Name: 1-Methoxy-2-propyl acetate (MPA)
      • CAS: 108-65-6
      • Purity:
      • Appearance: colourless liquid

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      Reliable factory customized supply 1-Methoxy-2-propyl acetate (MPA) 108-65-6

      • Molecular Formula:C6H12O3
      • Molecular Weight:132.159
      • Appearance/Colour:colourless liquid 
      • Vapor Pressure:3.7 mm Hg ( 20 °C) 
      • Melting Point:-87 °C 
      • Refractive Index:1.401 - 1.403 
      • Boiling Point:154.8 °C at 760 mmHg 
      • Flash Point:47.9 °C 
      • PSA:35.53000 
      • Density:0.959 g/cm3 
      • LogP:0.58440 

      1-Methoxy-2-propyl acetate(Cas 108-65-6) Usage

      Flammability and Explosibility

      Flammable

      Safety Profile

      Moderately toxic by intraperitoneal route. Slightly toxic by ingestion and skin contact. When heated to decomposition it emits acrid smoke and irritating vapors.

      Application

      1-Methoxy-2-propyl acetate is a high-grade industrial solvent with low toxicity and excellent performance. It has strong solubility for polar and non-polar substances. It is suitable for solvents of various polymers of high-grade coatings and inks, including aminomethyl ester, vinyl, polyester, cellulose acetate, alkyd resin, acrylic resin, epoxy resin and nitrocellulose. Among them. Propylene glycol methyl ether propionate is the best solvent in coatings and inks. It is suitable for unsaturated polyester, polyurethane resin, acrylic resin, epoxy resin, etc.

      General Description

      Propylene glycol monomethyl ether acetate (PGMEA) is a photoresist solvent. Its degradation by microorganisms in different soil types has been investigated. An oral reference dose (RfD) value of PGMEA has been obtained from inhalation studies. The solubility of (5-alkylsulfonyloxyimino-5H-thiophen-2-ylidene)-2-methylphenyl-acetonitriles in PGMEA has been analyzed.

      InChI:InChI=1/C5H10O3.C3H6/c1-5(6)8-4-3-7-2;1-3-2/h3-4H2,1-2H3;3H,1H2,2H3

      108-65-6 Relevant articles

      Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base

      -

      , (2016/05/24)

      A photoresist composition containing a p...

      A process for the preparation of acetate

      -

      Paragraph 0061; 0062; 0063; 0064, (2017/01/26)

      The invention relates to an acetate prep...

      Pattern-forming method, and radiation-sensitive composition

      -

      , (2016/06/01)

      A pattern-forming method includes provid...

      RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, POLYMER, AND METHOD FOR PRODUCING COMPOUND

      -

      , (2015/11/30)

      A radiation-sensitive resin composition ...

      108-65-6 Process route

      2-(1-methoxycarbonyl-1-methylethylazo)-2-methylpropionic acid methyl ester
      2589-57-3

      2-(1-methoxycarbonyl-1-methylethylazo)-2-methylpropionic acid methyl ester

      propylene glycol methyl ether acetate
      108-65-6,142300-82-1

      propylene glycol methyl ether acetate

      Conditions
      Conditions Yield
      In methanol; hexane; butanone;
      60%
      In methanol; hexane; water; butanone;
      60%
      1-methoxy-2-propanol
      107-98-2

      1-methoxy-2-propanol

      acetic acid
      64-19-7,77671-22-8

      acetic acid

      propylene glycol methyl ether acetate
      108-65-6,142300-82-1

      propylene glycol methyl ether acetate

      Conditions
      Conditions Yield
      at 98 ℃; under 130.002 Torr; Concentration;

      108-65-6 Upstream products

      • 107-98-2
        107-98-2

        1-methoxy-2-propanol

      • 108-24-7
        108-24-7

        acetic anhydride

      • 124-41-4
        124-41-4

        sodium methylate

      • 75-56-9
        75-56-9

        methyloxirane

      108-65-6 Downstream products

      • 4188-68-5
        4188-68-5

        methyl (Z)-prop-1-enyl ether

      • 4188-69-6
        4188-69-6

        (E)-1-Methoxy-1-propen

      • 627-40-7
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        methylallylether

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        (S)-1-Methoxy-propan-2-ol

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